Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas

Citation
S. Takashima et al., Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas, J APPL PHYS, 90(11), 2001, pp. 5497-5503
Citations number
42
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
11
Year of publication
2001
Pages
5497 - 5503
Database
ISI
SICI code
0021-8979(200112)90:11<5497:ACALKO>2.0.ZU;2-L
Abstract
A measurement technique of the absolute concentration of hydrogen (H) atoms in methane (CH4) and/or hydrogen molecule (H-2) plasmas has been establish ed. The H-atom concentration was evaluated by vacuum ultraviolet absorption spectroscopy (VUVAS) using a high-pressure H-2 microdischarge hollow catho de lamp (H-2-MHCL) as the Lyman alpha (L-alpha 121.6 nm) light emission sou rce. A measurement technique of the background absorption caused by species other than H atoms at the L-alpha line was developed by using the VUVAS te chnique with the MHCL employing nitrogen molecules (N-2-MHCL). The lines ar ound L-alpha used for the background absorption measurements are 2p(2)3s P- 4(5/2)-2p(3) S-4(3/2)0 at 119.955 nm, 2p(2)3s P-4(3/2)-2p(3) S-4(3/2)0 at 1 20.022 nm, and 2p(2)3s P-4(1/2)-2p(3) S-4(3/2)0 at 120.071 nm of the N atom . By using the VUVAS technique with the MHCLs and subtracting the backgroun d absorption from the absorption of H atoms at L-alpha, we have achieved th e measurement of the H-atom concentration in an inductively coupled plasma operated in CH4 and/or H-2. The H-atom concentration increased from 2x10(11 ) to 3x10(12) cm(-3) when increasing the CH4 flow rate ratios from 0% to 50 % in the CH4-H-2 mixture and was almost constant in its range between 50% a nd 100% at a pressure of 1.33 Pa, a radio frequency power of 200 W, and a t otal flow rate of 100 sccm. The behavior of the H-atom concentration was co mpared with that of the Balmer alpha emission intensity. The decay of the H -atom concentration in the H-2 plasma afterglow was investigated to clarify the loss kinetics of H atoms. The dependence of the decay time constant on the pressure showed that H atoms were dominantly lost through diffusion to the wall surface. The diffusion constant of H atoms in H-2 plasmas was det ermined to be 3.0x10(5) cm(2) Pa s(-1) at 400 K. The surface loss probabili ty of H atoms on the stainless-steel and the hydrocarbon walls were estimat ed to be 0.15 and 0.07, respectively. (C) 2001 American Institute of Physic s.