Hole Schottky barrier height enhancement and its application to metal-semiconductor-metal photodetectors

Authors
Citation
Sd. Lin et Cp. Lee, Hole Schottky barrier height enhancement and its application to metal-semiconductor-metal photodetectors, J APPL PHYS, 90(11), 2001, pp. 5666-5669
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
11
Year of publication
2001
Pages
5666 - 5669
Database
ISI
SICI code
0021-8979(200112)90:11<5666:HSBHEA>2.0.ZU;2-X
Abstract
Hole Schottky barrier heights on GaAs have been studied experimentally by u sing a conventional metal-semiconductor-metal photodetector (MSMPD) structu re. The Schottky barrier height for holes was obtained directly by the hole -current dominated dark current measurement of the MSMPD. With a thin, high ly doped surface layer, control of the Schottky barrier heights for holes f rom 0.48 to 0.79 eV was obtained. By using these engineered Schottky contac ts in the MSMPDs, over three orders of magnitude reduction in the dark curr ents of the MSMPDs was achieved. (C) 2001 American Institute of Physics.