R. Cui et al., In-situ monitoring of the growth of Bi2Te3 and Sb2Te3 films and Bi2Te3-Sb2Te3 superlattice using spectroscopic ellipsometry, J ELEC MAT, 30(11), 2001, pp. 1376-1381
In this work, we present in-situ monitoring of the growth of bismuth tellur
ide (Bi2Te3) and antimony telluride (Sb2Te3) thin films as well as Bi2Te3-S
b2Te3 superlattice using a spectroscopic ellipsometer (SE). Bi2Te3 and Sb2T
e3 films were grown by metalorganic chemical vapor deposition (MOCVD) at 35
0 degreesC. A 44-wavelength ellipsometer with spectral range from 404 nm to
740 nm was used in this work. The optical constants of Bi2Te3 and Sb2Te3 a
t growth temperature were determined by fitting a model to the extracted in
-situ SE data of optically thick Bi2Te3 and Sb2Te3 films. Compared to the o
ptical constants of Bi2Te3 and Sb2Te3 at room temperature, significant temp
erature dependence was observed. Using their optical constants at growth te
mperature, the in-situ growth of Bi2Te3 an Sb2Te3 thin films were modeled a
nd excellent fit between the experimental data arid data generated from the
best-fit model was obtained. In-situ growth of different Bi2Te3-Sb2Te3 sup
erlattices was also monitored and modeled. The growth of Bi2Te3 and Sb2Te3
layers can be seen clearly in in-situ SE data. Modeling of in-situ superlat
tice growth shows perfect superlattice growth with an abrupt interface betw
een the two constituent films.