Surface and interface analyses of UHV evaporated Nb/AlOx/Nb tri-layers

Citation
S. Naseem et N. Humera, Surface and interface analyses of UHV evaporated Nb/AlOx/Nb tri-layers, J MAT SCI T, 17, 2001, pp. S163-S166
Citations number
5
Categorie Soggetti
Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN journal
10050302 → ACNP
Volume
17
Year of publication
2001
Supplement
1
Pages
S163 - S166
Database
ISI
SICI code
1005-0302(2001)17:<S163:SAIAOU>2.0.ZU;2-Y
Abstract
We have prepared Nb thin films with e-beam evaporation under UHV conditions . Al thin films were deposited by resistive heating in the UHV chamber. The preparation of these films and the tri-layers of Nb/AlOx/Nb were intended for their use in Josephson junctions. The surface studies of these films we re undertaken by using scanning electron microscope and atomic force micros cope in the non-contact mode, whilst the interface analysis was carried out by depth profiling using scanning Auger microprobe. These studies have rev ealed that Nb films grown on AlOx are smoother than the ones grown on Si. F urther, it is seen that Al diffuses into Nb on both sides and that the inte rface is very broad. This intermixing of various materials results in the f ailure of the tri-layers when subjected to application in SQUIDs.