Recent progress of photo-resin for rapid prototyping, "resin for stereolithography"

Authors
Hagiwara, T
Citation
T. Hagiwara, Recent progress of photo-resin for rapid prototyping, "resin for stereolithography", MACRO SYMP, 175, 2001, pp. 397-402
Citations number
5
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
MACROMOLECULAR SYMPOSIA
ISSN journal
10221360 → ACNP
Volume
175
Year of publication
2001
Pages
397 - 402
Database
ISI
SICI code
1022-1360(200108)175:<397:RPOPFR>2.0.ZU;2-C