In the context of an assessment of the physical mechanisms governing thin o
xide degradation, this paper reports an experimental investigation of anode
hole injection (AHI) at low gate voltages (V-G) and of its correlation to
SILC generation. A new technique based on carrier separation measurements i
s introduced to interpret the behavior of the gate current (I-G) during con
stant V-G stress experiments. Our results indicate that AHI is still operat
ive at lower /V-G/ than previously thought, (C) 2001 Elsevier Science B.V.
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