Experimental study of low voltage anode hole injection in thin oxides

Citation
D. Esseni et al., Experimental study of low voltage anode hole injection in thin oxides, MICROEL ENG, 59(1-4), 2001, pp. 55-60
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
59
Issue
1-4
Year of publication
2001
Pages
55 - 60
Database
ISI
SICI code
0167-9317(200111)59:1-4<55:ESOLVA>2.0.ZU;2-7
Abstract
In the context of an assessment of the physical mechanisms governing thin o xide degradation, this paper reports an experimental investigation of anode hole injection (AHI) at low gate voltages (V-G) and of its correlation to SILC generation. A new technique based on carrier separation measurements i s introduced to interpret the behavior of the gate current (I-G) during con stant V-G stress experiments. Our results indicate that AHI is still operat ive at lower /V-G/ than previously thought, (C) 2001 Elsevier Science B.V. All rights reserved.