A new two-trap tunneling model for the anomalous stress-induced leakage current (SILC) in Flash memories

Citation
D. Ielmini et al., A new two-trap tunneling model for the anomalous stress-induced leakage current (SILC) in Flash memories, MICROEL ENG, 59(1-4), 2001, pp. 189-195
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
59
Issue
1-4
Year of publication
2001
Pages
189 - 195
Database
ISI
SICI code
0167-9317(200111)59:1-4<189:ANTTMF>2.0.ZU;2-Y
Abstract
We present new experimental and numerical results on the leakage current in Flash cells after cycling, showing that two markedly different behaviors c an be identified. Most tail cells show a leakage current that can be succes sfully described by single-trap tunneling. However, the unstable and very h igh leakage exhibited by a few anomalous cells requires a different explana tion. An improved physical model including two-trap tunneling processes can account for the large current enhancement in the anomalous cells, as well as explaining for the first time their asymmetric and erratic behavior. (C) 2001 Published by Elsevier Science B.V.