Light emission from 4H SiC MOSFETs with and without NO passivation

Citation
Re. Stahlbush et al., Light emission from 4H SiC MOSFETs with and without NO passivation, MICROEL ENG, 59(1-4), 2001, pp. 393-398
Citations number
5
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
59
Issue
1-4
Year of publication
2001
Pages
393 - 398
Database
ISI
SICI code
0167-9317(200111)59:1-4<393:LEF4SM>2.0.ZU;2-2
Abstract
Images and spectra of light emission from 4H SiC MOSFETs with and without N O annealing have been studied. The emission is induced by driving the chann el between accumulation and inversion. By varying the pulse train to the ga te, the flow of electrons into the channel can be tracked. The electron flo w in the NO-annealed MOSFEETs is an order of magnitude faster than the flow in the control MOSFETs without the anneal. Time resolved spectra allow emi ssion processes from the interface and bulk to be separated, but do not exh ibit significant differences between the MOSFETs with and without NO anneal ing. (C) 2001 Elsevier Science B.V. All rights reserved.