Images and spectra of light emission from 4H SiC MOSFETs with and without N
O annealing have been studied. The emission is induced by driving the chann
el between accumulation and inversion. By varying the pulse train to the ga
te, the flow of electrons into the channel can be tracked. The electron flo
w in the NO-annealed MOSFEETs is an order of magnitude faster than the flow
in the control MOSFETs without the anneal. Time resolved spectra allow emi
ssion processes from the interface and bulk to be separated, but do not exh
ibit significant differences between the MOSFETs with and without NO anneal
ing. (C) 2001 Elsevier Science B.V. All rights reserved.