Study on the mechanism of the depositon process of KTN thin film by pulsedlaser

Citation
Zh. Li et al., Study on the mechanism of the depositon process of KTN thin film by pulsedlaser, ACT PHY C E, 50(10), 2001, pp. 1950-1955
Citations number
11
Categorie Soggetti
Physics
Journal title
ACTA PHYSICA SINICA
ISSN journal
10003290 → ACNP
Volume
50
Issue
10
Year of publication
2001
Pages
1950 - 1955
Database
ISI
SICI code
1000-3290(200110)50:10<1950:SOTMOT>2.0.ZU;2-2
Abstract
According to energy balance consideration, the ablation ratio,formula of ta rget irradiated by pulsed laser is derived, and the spatial-characteristic equations of plasma generated by pulsed laser are obtained by using fluid d ynamic theory. Combining the ablation ratio formula with the spatial-charac teristic equations of plasma, the effects of different laser power density and wavelength on the deposition characteristics of Kta(0.65) Nb-0.35 O-3 ( KTN) thin film are studied on the basis of our experiments. And many valuab le results are obtained which have been discussed in detail. The calculated results are in agreement with experiments on the whole.