Photoluminescence of GaN grown by molecular-beam epitaxy on a freestandingGaN template

Citation
Ma. Reshchikov et al., Photoluminescence of GaN grown by molecular-beam epitaxy on a freestandingGaN template, APPL PHYS L, 79(23), 2001, pp. 3779-3781
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
23
Year of publication
2001
Pages
3779 - 3781
Database
ISI
SICI code
0003-6951(200112)79:23<3779:POGGBM>2.0.ZU;2-7
Abstract
Photoluminescence (PL) studies were performed on a 1.5-mum-thick GaN layer grown by molecular-beam epitaxy on a freestanding GaN template that in turn was grown by hydride vapor-phase epitaxy. PL spectra from both the epilaye r and the substrate contain a plethora of sharp peaks related to excitonic transitions. We identified the main peaks in the PL spectrum. Taking advant age of the observation of donor bound exciton peaks and their associated tw o-electron satellites, we have determined the binding energies of two disti nct shallow donors (28.8 and 32.6 meV), which are attributed to Si and O, r espectively. (C) 2001 American Institute of Physics.