Rc. Wetherhold et Hd. Chopra, Beam model for calculating magnetostriction strains in thin films and multilayers, APPL PHYS L, 79(23), 2001, pp. 3818-3820
A standard technique to measure the magnetostriction strain in thin films i
nvolves measurement of the end deflection or slope of cantilever beams usin
g optical deflectometry or capacitive methods. This article presents a gene
ral beam model for inferring magnetostriction strain from the end deflectio
n or slope data. This model greatly extends the range of applicability over
existing shell models, allowing for inference of magnetostriction strains
for practical film/substrate thickness ratios that are important in microel
ectromechanical systems (MEMS) and bio-microelectromechanical systems (bio-
MEMS). If the properties of individual layers are known, the beam theory ca
n be used to design multilayer MEMS or bio-MEMs beams over a full range of
thickness ratios. (C) 2001 American Institute of Physics.