Controlled striped phase formation on ultraflat Si(001) surfaces during diborane exposure

Citation
Jf. Nielsen et al., Controlled striped phase formation on ultraflat Si(001) surfaces during diborane exposure, APPL PHYS L, 79(23), 2001, pp. 3857-3859
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
23
Year of publication
2001
Pages
3857 - 3859
Database
ISI
SICI code
0003-6951(200112)79:23<3857:CSPFOU>2.0.ZU;2-9
Abstract
We have used low-energy electron microscopy to study spontaneous step forma tion in "striped" domains on ultraflat Si(001)-(2x1) surfaces during B2H6 e xposure at elevated temperatures. We show that the size and arrangement of striped domains are kinetically limited, and propose that the limiting fact or is the supply of diffusing Si surface adatoms. By adding controlled amou nts of extra Si to ultraflat terraces, it is possible to foster the formati on of very large (>5 mum) single-domain striped regions with adjustable str ipe widths. (C) 2001 American Institute of Physics.