We have used low-energy electron microscopy to study spontaneous step forma
tion in "striped" domains on ultraflat Si(001)-(2x1) surfaces during B2H6 e
xposure at elevated temperatures. We show that the size and arrangement of
striped domains are kinetically limited, and propose that the limiting fact
or is the supply of diffusing Si surface adatoms. By adding controlled amou
nts of extra Si to ultraflat terraces, it is possible to foster the formati
on of very large (>5 mum) single-domain striped regions with adjustable str
ipe widths. (C) 2001 American Institute of Physics.