Laser ablation and deposition of Bioglass((R)) 45S5 thin films

Citation
L. D'Alessio et al., Laser ablation and deposition of Bioglass((R)) 45S5 thin films, APPL SURF S, 183(1-2), 2001, pp. 10-17
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
183
Issue
1-2
Year of publication
2001
Pages
10 - 17
Database
ISI
SICI code
0169-4332(20011112)183:1-2<10:LAADOB>2.0.ZU;2-H
Abstract
A study of the laser ablation and deposition, on Ti6Al4V substrates, of a b iological active glass (Bioglass (R) 45S5) is reported. The gaseous phase c omposition has been determined by laser ablation inductively coupled plasma mass spectrometry, optical imaging and emission spectroscopy. The deposite d films were studied by scanning electron microscopy coupled with energy an d wavelength dispersive X-ray analysis and X-ray diffraction. The adhesion of films to the substrates has been studied by scratch tests. Moreover, aft er exposing the coatings to a simulating body fluid solution. their bioacti vity has been monitored by X-ray diffraction analysis of the hydroxylapatit e growth. This procedure has been followed for different time scales up to a maximum of 24 days. The deposition mechanism seems to be related mainly to the mechanical trans port of the target material in form of droplets, while the gaseous phase, h aving a very different composition, plays a marginal role. The overall film retains the target stoichiometry and bioactivity in a large range of exper imental conditions. (C) 2001 Elsevier Science B.V. All rights reserved.