Copper thin coating deposition on natural pollen particles

Citation
Ln. Xu et al., Copper thin coating deposition on natural pollen particles, APPL SURF S, 183(1-2), 2001, pp. 58-61
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
183
Issue
1-2
Year of publication
2001
Pages
58 - 61
Database
ISI
SICI code
0169-4332(20011112)183:1-2<58:CTCDON>2.0.ZU;2-M
Abstract
We have deposited thin copper coatings on micro-sized natural pollen partic les by electroless plating, using palladium as the catalyst, copper sulfate as the source of deposited metal, and formaldehyde as the reducing agent. A two-step pretreatment process is used to activate the pollen surface with stannous chloride and palladium chloride. The results of XRD, SEM, AES, an d cross-section metallography show that the pollen particles are completely coated by a pure and porous FCC-structured crystalline copper film about 1 mum thick. The film is composed of spherical and some needle-shaped metall ic copper particles. The latter are attributed to the strong aggregation te ndency among neighboring nano-sized copper particles grown with rapid hydro gen release. We find that lightweighted pollen particles are good candidate s for fabricating metallic composite microspheres with core-shell structure s. (C) 2001 Elsevier Science B.V. All rights reserved.