We have studied the morphological evolution of Ni(110) surface induced by l
ow-energy ion sputtering at room temperature with scanning tunneling micros
copy. We found that there are two different time regimes in the sputtering
processes. In the first regime, a ripple structure is formed with the wave
vector along the direction [110] due to the strong diffusion bias along the
direction and the surface roughness increases fast with time. However, in
the second regime, three-dimensional mounds are formed with absent anisotro
py and the logarithmic surface roughness becomes saturated. (C) 2001 Elsevi
er Science B.V. All rights reserved.