In view of the principle of glow-discharge, ultrathin Ni81Fe19(12 nm) films
were prepared at an ultrahigh base vacuum. The anisotropic magnetoresistan
ce coefficient (DeltaR/R %) for Ni81Fe19(12 nm) film reaches 1.2%, while th
e value of its coercivity is 127 A/m (i.e. 1.6 Oe). Ultrathin Ni81Fe19(12 n
m) films were also prepared at a lower base vacuum. The comparison of the s
tructure for two kinds of films shows that the films prepared at an ultrahi
gh base vacuum have a smoother surface, a denser structure with a few defec
ts; the films prepared at a lower base vacuum have a rougher surface, a por
ouser structure with some defects.