Ultrathin permalloy films

Citation
Gh. Yu et al., Ultrathin permalloy films, CHIN SCI B, 46(20), 2001, pp. 1681-1685
Citations number
10
Categorie Soggetti
Multidisciplinary
Journal title
CHINESE SCIENCE BULLETIN
ISSN journal
10016538 → ACNP
Volume
46
Issue
20
Year of publication
2001
Pages
1681 - 1685
Database
ISI
SICI code
1001-6538(200110)46:20<1681:UPF>2.0.ZU;2-5
Abstract
In view of the principle of glow-discharge, ultrathin Ni81Fe19(12 nm) films were prepared at an ultrahigh base vacuum. The anisotropic magnetoresistan ce coefficient (DeltaR/R %) for Ni81Fe19(12 nm) film reaches 1.2%, while th e value of its coercivity is 127 A/m (i.e. 1.6 Oe). Ultrathin Ni81Fe19(12 n m) films were also prepared at a lower base vacuum. The comparison of the s tructure for two kinds of films shows that the films prepared at an ultrahi gh base vacuum have a smoother surface, a denser structure with a few defec ts; the films prepared at a lower base vacuum have a rougher surface, a por ouser structure with some defects.