The aluminum nitride (AlN) thin film has been investigated for using in pH-
ISFET (ion-sensitive field-effect transistor) devices. The AlN thin film wa
s used as the sensitive membrane for simulating and analyzing the pH sensin
g properties. According to the simulation, we find that the AlN/SiO2 gate I
SFET has high pH sensitivity and has a linear response for the current-volt
age (I-V) and capacitance-voltage (C-V) curves. In the simulation, the pH s
ensitivity is about 52-59.8 mV/pH for adapting ill all testing solutions (p
H = 1-14). In addition, in the experiment, the I-V and C-V curves of AlN/Si
O2 gate ISFET were also measured and the pH-sensing property was discussed
in the different buffer solutions.