Simulation and experimental study of the pH-sensing property for AlN thin films

Citation
Jl. Chiang et al., Simulation and experimental study of the pH-sensing property for AlN thin films, JPN J A P 1, 40(10), 2001, pp. 5900-5904
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
10
Year of publication
2001
Pages
5900 - 5904
Database
ISI
SICI code
Abstract
The aluminum nitride (AlN) thin film has been investigated for using in pH- ISFET (ion-sensitive field-effect transistor) devices. The AlN thin film wa s used as the sensitive membrane for simulating and analyzing the pH sensin g properties. According to the simulation, we find that the AlN/SiO2 gate I SFET has high pH sensitivity and has a linear response for the current-volt age (I-V) and capacitance-voltage (C-V) curves. In the simulation, the pH s ensitivity is about 52-59.8 mV/pH for adapting ill all testing solutions (p H = 1-14). In addition, in the experiment, the I-V and C-V curves of AlN/Si O2 gate ISFET were also measured and the pH-sensing property was discussed in the different buffer solutions.