Evaluation of parameters in atmospheric-pressure chemical vapor depositionof borophosphosilicate glass using tetraethylorthosilicate and ozone

The effective parameters for the atmospheric-pressure chemical vapor deposi tion (APCVD) of borophosphosilicate glass (BPSG) using tetraethylorthosilic ate (TEOS) and ozone were evaluated by designing an experiment, Source effi ciencies of the deposition and doping were evaluated at constant boron and phosphorus concentrations. Each parameter was also characterized in terms o f uniformity and film properties, such as thermal shrinkage and wet etch ra te. Interactions between boron and phosphorus were discussed in terms of th e difference in influential parameters and reaction rates. The deposition w as controlled by the deposition temperature and the deposition rate, which are the dominant parameters of the film quality and deposition efficiency. The balance between gas flow rate and temperature is important to improve d eposition and doping uniformity.