Novel laser etching was demonstrated by one-shot femtosecond laser ablation
of a transparent organic amorphous film. The etch depth increased stepwise
with increasing laser fluence and each step is constant and independent of
the fluence, while the number of steps and etching area increase with the
fluence. The successive depths were 270, 480, 690 and 820 nm, for which the
thresholds were 180, 180, 210 and 290 mJ/cm(2), respectively. A fifth step
was not observed in the present fluence range. Both the etched surfaces an
d slopes between the steps are very smooth with a roughness of less than 10
nm. The mechanism is proposed and discussed in view of the optical interfe
rence effect and a possible application is mentioned.