T. Ohmori et al., Influence of sputtering parameters on electrochemical CO2 reduction in sputtered Au electrode, J ELEC CHEM, 514(1-2), 2001, pp. 51-55
Electrochemical CO2 reduction was studied in KCl and KHCO3 using a Au elect
rode prepared by sputtering. We investigated the influence of the sputterin
g parameters (rf power, Ar pressure during deposition, and the distance bet
ween substrate and target) and thickness on the reduction potential and pro
ducts, CO and H-2, In KCl, the reduction potential, i.e. the overvoltage, w
as influenced by the Ar pressure, which affects the Au surface geometrical
structure/surface area, while in KHCO3, the potential remained almost const
ant, probably due to the neutralizing capacity of KHCO3. The other sputteri
ng parameters did not change the CO2 reduction behavior appreciably. (C) 20
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