Influence of sputtering parameters on electrochemical CO2 reduction in sputtered Au electrode

Citation
T. Ohmori et al., Influence of sputtering parameters on electrochemical CO2 reduction in sputtered Au electrode, J ELEC CHEM, 514(1-2), 2001, pp. 51-55
Citations number
18
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTROANALYTICAL CHEMISTRY
ISSN journal
15726657 → ACNP
Volume
514
Issue
1-2
Year of publication
2001
Pages
51 - 55
Database
ISI
SICI code
Abstract
Electrochemical CO2 reduction was studied in KCl and KHCO3 using a Au elect rode prepared by sputtering. We investigated the influence of the sputterin g parameters (rf power, Ar pressure during deposition, and the distance bet ween substrate and target) and thickness on the reduction potential and pro ducts, CO and H-2, In KCl, the reduction potential, i.e. the overvoltage, w as influenced by the Ar pressure, which affects the Au surface geometrical structure/surface area, while in KHCO3, the potential remained almost const ant, probably due to the neutralizing capacity of KHCO3. The other sputteri ng parameters did not change the CO2 reduction behavior appreciably. (C) 20 01 Elsevier Science B.V. All rights reserved.