Interfacial crystallization of isotactic polypropylene molded against the copper surface with various surface roughnesses prepared by an electrochemical process
Cw. Lin et al., Interfacial crystallization of isotactic polypropylene molded against the copper surface with various surface roughnesses prepared by an electrochemical process, J MATER SCI, 36(20), 2001, pp. 4943-4948
The influence of surface topography of copper (Cu) sheet on the heterogeneo
us nucleation of isotactic polypropylene (iPP) at the iPP/Cu interface had
been investigated mainly using polarized optical microscope with hot stage.
Various textures of Cu surfaces prepared by sandpaper polishing and electr
ochemical anodizing had been made and they were utilized to induce interfac
ial nucleation of iPP upon supercooling. This process enables us to change
the topological feature of the copper surface without changing their chemic
al compositions. The pretreated surfaces were quantitatively characterized
by a surface texture instrument in terms of RMS roughness (R-a). Copper sur
face with higher surface roughness induced more nuclei of iPP and led to a
thicker transcrystalline layer in the interfacial region upon supercooling
over the temperature range 128 degreesC < T-c < 134 degreesC. Based on the
theory of heterogeneous nucleation, it was found that the induction time co
rrelates well with the nucleation rate in determining the interfacial free
energy difference function Delta sigma of iPP The ratio of Delta sigma at t
he interface to that in the bulk matrix (Delta sigma (TCL)/Delta sigma (bul
k)) for the polished surface (R-a = 0.09 mum) is 2.89, implying the transcr
ystallization growth is unfavorable from a thermodynamic point of view. The
ratio of Delta sigma (TCL)/Delta sigma (bulk) becomes smaller as the curre
nt density for anodizing increases, indicating the transcrystallization gro
wth is getting favorable. Moreover, induction times and nucleation rates we
re also measured to characterize quantitatively the nucleating ability of v
arious Cu surfaces. (C) 2001 Kluwer Academic Publishers.