Creep resistance of two MoSi2-based materials containing SiC and HfO2 parti
cles, respectively, in ambient atmosphere was studied in the temperature ra
nge 1100-1400 degreesC under a load of 100 MPa. The microstructure and its
response to hi.-h-temperature load were investigated by TEM using the thin
foil technique. Comparison of the creep resistance of both materials at eac
h particular testing temperature shows that the performance of MoSi2-HfO2 i
s about one order of magnitude better than the other one. (C) 2001 Elsevier
Science B.V. All rights reserved.