Advanced 2D/3D ESD device simulation - a powerful tool already used in a pre-Si phase

Citation
K. Esmark et al., Advanced 2D/3D ESD device simulation - a powerful tool already used in a pre-Si phase, MICROEL REL, 41(11), 2001, pp. 1761-1770
Citations number
19
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
41
Issue
11
Year of publication
2001
Pages
1761 - 1770
Database
ISI
SICI code
0026-2714(200111)41:11<1761:A2EDS->2.0.ZU;2-M
Abstract
The tremendous advantages of adequate 2D/3D device simulations for ESD opti mization are demonstrated. The pre-silicon ESD-protection concept of a new CMOS technology was completely based on high-current I-V characteristics si mulated for different NMOS variations. Silicon verification proved the exce llent simulation quality of the electrical behavior and. furthermore, gives an idea of ESD thresholds and their dependencies on layout and technology parameters. (C) 2001 Elsevier Science Ltd. All rights reserved.