Jc. Yang et al., Surface kinetics of copper oxidation investigated by in situ ultra-high vacuum transmission electron microscopy, MICROS MICR, 7(6), 2001, pp. 486-493
We review our studies of the initial oxidation stages of Cu(001) thin films
as. investigated by in situ ultra-high vacuum transmission electron micros
copy. We present our observations of surface reconstruction and the nucleat
ion to coalescence of copper oxide during in situ oxidation in O-2. We have
proposed a semi-quantitative model, where oxygen surface diffusion is the
dominant mechanism of the initial oxidation stages of Cu. We have also inve
stigated the effect of water vapor on copper oxidation. We have observed th
at the presence of water vapor in the oxidizing atmosphere retards the rate
of Cu oxidation and Cu2O is reduced when exposed directly to steam.