Surface kinetics of copper oxidation investigated by in situ ultra-high vacuum transmission electron microscopy

Citation
Jc. Yang et al., Surface kinetics of copper oxidation investigated by in situ ultra-high vacuum transmission electron microscopy, MICROS MICR, 7(6), 2001, pp. 486-493
Citations number
26
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
MICROSCOPY AND MICROANALYSIS
ISSN journal
14319276 → ACNP
Volume
7
Issue
6
Year of publication
2001
Pages
486 - 493
Database
ISI
SICI code
1431-9276(200111/12)7:6<486:SKOCOI>2.0.ZU;2-2
Abstract
We review our studies of the initial oxidation stages of Cu(001) thin films as. investigated by in situ ultra-high vacuum transmission electron micros copy. We present our observations of surface reconstruction and the nucleat ion to coalescence of copper oxide during in situ oxidation in O-2. We have proposed a semi-quantitative model, where oxygen surface diffusion is the dominant mechanism of the initial oxidation stages of Cu. We have also inve stigated the effect of water vapor on copper oxidation. We have observed th at the presence of water vapor in the oxidizing atmosphere retards the rate of Cu oxidation and Cu2O is reduced when exposed directly to steam.