Multilayered phase formation after high-fluence implantation of nickel into aluminium

Citation
A. Hessler-wyser et al., Multilayered phase formation after high-fluence implantation of nickel into aluminium, PHIL MAG L, 81(12), 2001, pp. 893-899
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE LETTERS
ISSN journal
09500839 → ACNP
Volume
81
Issue
12
Year of publication
2001
Pages
893 - 899
Database
ISI
SICI code
0950-0839(200112)81:12<893:MPFAHI>2.0.ZU;2-4
Abstract
The formation of crystalline and amorphous layers has been observed in Al c rystals after 5 MeV Ni implantation up to a fluence of 7.6x10(17) Ni atoms cm(-2). The layers are structured into sublayers perpendicular to the impla ntation direction with sharp interfaces between the phases and almost symme trically arranged to both sides of the maximum of the implantation profile. The sublayers of thickness of the order of 100 nm were analysed by transmi ssion electron microscopy. They consist of polycrystalline Al3Ni, crystalli ne Al3Ni precipitates and small amorphous zones, depending on the local Ni implantation concentration.