Yr. Ma et al., Tip-induced local anodic oxidation on the native SiO2 layer of Si(111) using an atomic force microscope - art. no. 195324, PHYS REV B, 6419(19), 2001, pp. 5324
Atomic force mocroscope (AFM) tip-induced local anodic oxidation on a nativ
e SiO2 layer of Si(111) which is in contact mode is presented in an ambient
way. This local anodic oxidation was subjected to varying sample voltages.
When an AFM tip was positioned on a surface point with various voltage pul
ses of 10 V point oxide protrusions were tip induced. The protruded height
grew exponentially due to the duration. Large-area oxide bumps also become
tip induced when an AFM tip was swept across large surface areas. The bump
height increased and was linearly dependent on the sample voltage. Two poss
ible approaches to local anodic oxidation on the native SiO2 layer are disc
ussed.