Oscillation of the optical second-harmonic generation intensity during Ag thin film growth on a Si(111)7X7 surface - art. no. 195415
Citation
H. Hirayama et al., Oscillation of the optical second-harmonic generation intensity during Ag thin film growth on a Si(111)7X7 surface - art. no. 195415, PHYS REV B, 6419(19), 2001, pp. 5415
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
SICI code
0163-1829(20011115)6419:19<5415:OOTOSG>2.0.ZU;2-2
Abstract
The optical second harmonic generation (SHG) intensity demonstrated clear o
scillations during Ag thin film growth on an Si(111)7x7 surface at room tem
perature. The first intensity peak appeared at two monolayer (ML) for 1.20,
1.30, and 1.40 eV pump photon energies, and the second peak shifted to a l
ower coverage side with increases in the excitation photon energy. The SHG
spectra and atomic force microscope images indicated that the first peak wa
s due to local field enhancement by the plasmon confined in isolated Ag isl
ands. The second peak was caused by resonance with the quantized electronic
states confined in the flat Ag thin film.