Measurement of complex optical constants of a highly doped Si wafer using terahertz ellipsometry

Citation
T. Nagashima et M. Hangyo, Measurement of complex optical constants of a highly doped Si wafer using terahertz ellipsometry, APPL PHYS L, 79(24), 2001, pp. 3917-3919
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
24
Year of publication
2001
Pages
3917 - 3919
Database
ISI
SICI code
0003-6951(200112)79:24<3917:MOCOCO>2.0.ZU;2-Z
Abstract
We propose and demonstrate a terahertz (THz) time-domain spectroscopy combi ned with ellipsometry. The complex optical constants of a Si wafer with low resistivity are deduced from the measurements of the wave forms of reflect ed s- and p-polarized THz pulses without reference measurement. The obtaine d dispersion of refractive index above similar to0.2 THz shows good agreeme nt with that predicted by the Drude theory. The complex optical constants d educed by the THz ellipsometry in the low-frequency region are strongly aff ected by the slight error of the ellipsometric angle originating mainly fro m the misalignment of the rotation angles of the polarizer and analyzer. (C ) 2001 American Institute of Physics.