Effect of photopolymerization on the rate of photocrosslink in chalcone-based oligomeric compounds

A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Ph otosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) sp ectroscopies. The result of spectroscopic analysis substantiated that the t wo chalcone-based compounds have functions of both photocrosslinking and ph otopolymerization by UV exposure in the presence of photoinitiator. Two kin ds of photochemical reactions proceeded competitively during UV exposure. P articularly, we studied the effect of photopolymerization on the rate of ph otocrosslink due to cycloaddition in the two oligomeric compounds.