Recent developments of the stoichiometric displacement model for separation processes

Citation
Xd. Geng et al., Recent developments of the stoichiometric displacement model for separation processes, CHIN SCI B, 46(21), 2001, pp. 1763-1772
Citations number
90
Categorie Soggetti
Multidisciplinary
Journal title
CHINESE SCIENCE BULLETIN
ISSN journal
10016538 → ACNP
Volume
46
Issue
21
Year of publication
2001
Pages
1763 - 1772
Database
ISI
SICI code
1001-6538(200111)46:21<1763:RDOTSD>2.0.ZU;2-8
Abstract
Substantial attention has been paid to the stoichiometric displacement mode ls for solute retention (SDM-R) in liquid chromatography and adsorption (SD M-A) at surfaces since they were developed. The SDM has a strongly theoreti cal basis and has evolved to the point that it is widely applied in chemist ry, biochemistry, molecular biology and biotechnology. This review introduc es the history, recent developments, and new concepts relating to the SDM, including theory, mathematical expressions, and applications across a broad range of fields.