T. Szorenyi et al., Correlation between hydrogen content and structure of pulsed laser deposited carbon nitride films, DIAM RELAT, 10(12), 2001, pp. 2107-2112
Carbon nitride films fabricated by ablating a graphite target in an N-2 atm
osphere possess a high affinity for hydrogen incorporation. The differences
in both the absolute values and the depth distribution of hydrogen within
the films correlate well with changes in mass density. The dense films, dep
osited at and below 5 Pa N-2 pressure, contain 1.6-3.4 at.% hydrogen with t
wo maxima in the depth distribution, namely one near the surface and anothe
r one at the substrate-film interface, suggesting both in situ and ex situ
incorporation. Significantly higher hydrogen contents (12.8-16.45 at.%) uni
formly distributed throughout the whole thickness characterize the less den
se films grown in the 50-100-Pa pressure domain. These films are hydrogenat
ed ex situ as a consequence of the penetration of hydrogen from the atmosph
eric air through their open structure. The hydrogen content of the unintent
ionally hydrogenated carbon nitride films is a sensitive indicator of the c
hanges in film microstructure. (C) 2001 Elsevier Science B.V. All rights re
served.