Field emission from patterned carbon nanotube emitters produced by microwave plasma chemical vapor deposition

Large area carbon nanotube patterns were fabricated by microwave plasma che mical vapor deposition. The carbon nanotubes were grown on pre-patterned ca talyst films. Scanning electron microscopy and Raman spectroscopy were used to characterize the structure of the carbon nanotubes. The carbon nanotube s were very uniform and approximately 100 nm in diameter. The Raman spectru m shows a good graphitization for the carbon nanotubes. Aligned growth was found on the pattern line area. Field emission characteristics of the patte rns were characterized. A threshold field of 2.0 V / mum and emission curre nt density of 1.1 mA/cm(2) at 3.6 V / mum were achieved. A clear and stable image showing the patterns were obtained. (C) 2001 Elsevier Science B.V. A ll rights reserved.