Surface wave plasma production employing high-permittivity material for microwave window

As a novel method of large-diameter plasma production for ultralarge-scale integrated (ULSI) circuit processes, microwave plasma production employing a high-permittivity material window is proposed. A systematic plasma densit y enhancement is found to occur in conjunction with increase in the permitt ivity value of the dielectric window material. The results are shown to be due to the surface wave, and the microwave power consumption mainly occurs near the window in the high permittivity. This plasma production can provid e a good downstream plasma with a large diameter for ULSI processes.