X-ray induced persistent photoconductivity in Si-doped Al0.35Ga0.65As

Citation
Ya. Soh et al., X-ray induced persistent photoconductivity in Si-doped Al0.35Ga0.65As, J APPL PHYS, 90(12), 2001, pp. 6172-6176
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
12
Year of publication
2001
Pages
6172 - 6176
Database
ISI
SICI code
0021-8979(200112)90:12<6172:XIPPIS>2.0.ZU;2-P
Abstract
We demonstrate that x-ray irradiation can be used to induce an insulator-me tal transition in Si-doped Al0.35Ga0.65As, a semiconductor with DX centers. The excitation mechanism of the DX centers into their shallow donor state was revealed by studying the photoconductance along with fluorescence. The photoconductance as a function of incident x-ray energy exhibits an edge bo th at the Ga and As K edge, implying that core-hole excitation of Ga and As are efficient primary steps for the excitation of DX centers. A high quant um yield (>1) suggests that the excitation is indirect and nonlocal, due to secondary electrons, holes, and fluorescence photons. (C) 2001 American In stitute of Physics.