Temperature-dependent contactless electroreflectance and photoluminescencestudy of GaAlAs/InGaAs/GaAs pseudomorphic high electron mobility transistor structures
Dy. Lin et al., Temperature-dependent contactless electroreflectance and photoluminescencestudy of GaAlAs/InGaAs/GaAs pseudomorphic high electron mobility transistor structures, J APPL PHYS, 90(12), 2001, pp. 6421-6427
Temperature-dependent contactless electroreflectance (CER) and photolumines
cence (PL) measurements in the range of 30 K <T < 300 K on two GaAlAs/InGaA
s/GaAs pseudomorphic high electron mobility transistor structures with diff
erent well widths fabricated by molecular-beam epitaxy on (100) GaAs substr
ates are presented. For the CER measurement, the 11H transition is complete
ly screened out by the two-dimensional electron gas and the prominent featu
re related to the Fermi energy edge singularity transition showed a Stokes
shift to higher energy with respect to the 21H transition of the PL measure
ments at low temperature. From the Stokes shifts, the Fermi energy level of
the system is evaluated, and hence, the density of the two-dimensional ele
ctron gas. The temperature-dependent PL measurements revealed two features,
identified to be the 11H and 21H transitions. The relative intensities of
the 11H and 21H transitions were analyzed taking into account the effect of
the subband filling and the wave-function overlap factors. A good agreemen
t is found between experimental data and theoretical calculation results. (
C) 2001 American Institute of Physics.