Effect of backgating on the field distribution in planar thin-film GaAs structures

Citation
Nb. Gorev et al., Effect of backgating on the field distribution in planar thin-film GaAs structures, MICROELEC J, 32(12), 2001, pp. 979-982
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS JOURNAL
ISSN journal
00262692 → ACNP
Volume
32
Issue
12
Year of publication
2001
Pages
979 - 982
Database
ISI
SICI code
0026-2692(200112)32:12<979:EOBOTF>2.0.ZU;2-6
Abstract
The distribution of the electric field in planar film-substrate GaAs struct ures under backgating is considered. It is shown that backgating can make t he film exhibit a long-length region of a low-gradient electric field excee ding the threshold of N-type negative differential mobility, the magnitude of negative differential mobility in this region being high enough. At valu es of the film doping density and film thickness typical of GaAs transferre d-electron devices, this region can be as long as several tens of micromete rs. The underlying physical mechanism is discussed. (C) 2001 Elsevier Scien ce Ltd. All rights reserved.