Hopping transport of positrons in hydrogenated amorphous silicon - art. no. 217401

Citation
Dt. Britton et al., Hopping transport of positrons in hydrogenated amorphous silicon - art. no. 217401, PHYS REV L, 8721(21), 2001, pp. 7401
Citations number
20
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
8721
Issue
21
Year of publication
2001
Database
ISI
SICI code
0031-9007(20011119)8721:21<7401:HTOPIH>2.0.ZU;2-F
Abstract
Positron beam timing spectroscopy has been used to investigate positron dif fusion in hydrogenated amorphous silicon between 85 and 350 K. The diffusiv ity is determined from both the contribution of the surface, where the posi trons have a different characteristic annihilation rate, and its effect on the shape of the bulk annihilation rate distribution. We observe a single p ositron state with a temperature independent lifetime of 322 ps. From the t emperature dependence of the positron diffusion we show that this is a loca lized state and present the first ever direct observation of hopping diffus ion of positrons in solids. The migration enthalpy for positrons in this st ate is found to be 17.7(3) meV.