Ablation of polyethylene terephthalate at 266 nm

Authors
Mansour, N Ghaleh, KJ
Citation
N. Mansour et Kj. Ghaleh, Ablation of polyethylene terephthalate at 266 nm, APPL PHYS A, 74(1), 2002, pp. 63-67
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
74
Issue
1
Year of publication
2002
Pages
63 - 67
Database
ISI
SICI code
0947-8396(200201)74:1<63:AOPTA2>2.0.ZU;2-P
Abstract
Microstructures of micrometer sizes are produced on the surface of polyethy lene terephthalate using nanosecond Nd:YAG-laser irradiation at 266 nm wave length. The stable and well-defined structures were investigated using scan ning electron microscopy. A theoretical model is suggested for the nonlinea r behavior of etch depth versus incident laser fluence. In this model, two- photon stepwise absorption of chromophores is the dominant mechanism.