Effect of polymer addition and temperature on the structure of silicon-based polymer films deposited by excimer laser ablation of hexaphenyldisilane

Citation
M. Suzuki et al., Effect of polymer addition and temperature on the structure of silicon-based polymer films deposited by excimer laser ablation of hexaphenyldisilane, J PHOTOCH A, 145(3), 2001, pp. 223-228
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
ISSN journal
10106030 → ACNP
Volume
145
Issue
3
Year of publication
2001
Pages
223 - 228
Database
ISI
SICI code
1010-6030(200112)145:3<223:EOPAAT>2.0.ZU;2-T
Abstract
The effects of the cooling target, heating substrate, and the addition of p olysilanes were studied to control the film structure and properties of sil icon-based polymer films synthesized by laser ablation deposition of hexaph enyldisilane (HPDS). The cooling target reduced the thermal effect, and the resultant film structure differed from that without cooling. The film stru cture was changed by the heating substrate and exhibited significant microh ardness, while the thermal stability was not improved. The addition of poly silanes, in particular poly(dimethylsilane) (PDMS), was very effective in d eveloping the Si-C! network structure in the resultant films. (C) 2001 Else vier Science B.V. All rights reserved.