The structural and magnetic properties of p-GaN implanted with high doses o
f Mn+ or Fe+ (0.1-5 at%) and subsequently annealed at 700-1000 degreesC wer
e examined by transmission electron microscopy, selected-area diffraction p
atterns, X-ray diffraction and SQUID magnetometry. The implanted samples sh
owed paramagnetic behavior on a large diamagnetic background signal for imp
lantation doses below 3 at% Mn or Fe. At higher doses the samples showed si
gnatures of ferromagnetism with Curie temperatures < 250 K for Mn and < 150
K for Fe implantation. The structural analysis of the Mn-implanted GaN sho
wed regions consistent with the formation of GaxMn1-xN platelets occupying
similar to5% of the implanted volume. An estimate of similar to (5.5 +/- 1.
9)mu (B) per Mn was obtained, consistent with the expected value (5.0) for
a half-filled shell. The formation of secondary phases such as MnxGay or Mn
xNy was excluded by careful diffraction analysis. The implantation process
may have application in forming selected-area contact regions for spin-pola
rized carrier injection in device structures and in enabling a quick determ
ination of the Curie temperatures in dilute magnetic semiconductor host mat
erials.