Phase stability of the photoconductive polysiloxane-based photorefractive composites

Citation
Sz. Wu et al., Phase stability of the photoconductive polysiloxane-based photorefractive composites, POLYM-PLAST, 40(5), 2001, pp. 627-634
Citations number
15
Categorie Soggetti
Material Science & Engineering
Journal title
POLYMER-PLASTICS TECHNOLOGY AND ENGINEERING
ISSN journal
03602559 → ACNP
Volume
40
Issue
5
Year of publication
2001
Pages
627 - 634
Database
ISI
SICI code
0360-2559(2001)40:5<627:PSOTPP>2.0.ZU;2-O
Abstract
This article discusses the phase stability of the photoconductive poly silo xane-based photorefractive composites as studied by the light-scattering me thod. The photorefractive properties of the composites were studied by the two-beam coupling technique. The effects of the electric field on the photo refractive property of the composites were investigated as well. The phase stability was found to be dependent on the chromophore concentration and st orage temperature. The two-beam coupling gain coefficient of the composites increased with increasing electric field and chromophore content.