Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns - art. no. 063407

Authors
Kok, P Boto, AN Abrams, DS Williams, CP Braunstein, SL Dowling, JP
Citation
P. Kok et al., Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns - art. no. 063407, PHYS REV A, 6306(6), 2001, pp. 3407
Citations number
12
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW A
ISSN journal
10502947 → ACNP
Volume
6306
Issue
6
Year of publication
2001
Database
ISI
SICI code
1050-2947(200106)6306:6<3407:QOLTAT>2.0.ZU;2-B
Abstract
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. H ere, we generalize this procedure in order to create patterns in one and tw o dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.