Electron energy distribution functions and the influence on fluorocarbon plasma chemistry

Citation
H. Sugai et al., Electron energy distribution functions and the influence on fluorocarbon plasma chemistry, PLASMA SOUR, 10(2), 2001, pp. 378-385
Citations number
17
Categorie Soggetti
Physics
Journal title
PLASMA SOURCES SCIENCE & TECHNOLOGY
ISSN journal
09630252 → ACNP
Volume
10
Issue
2
Year of publication
2001
Pages
378 - 385
Database
ISI
SICI code
0963-0252(200105)10:2<378:EEDFAT>2.0.ZU;2-W
Abstract
Two different modes of electron heating are found in microwave discharges: the bulk heating mode characterized with low electron density n(e) and high electron temperature T-e (similar to 10 eV), and the surface heating mode with high n(e) and low T-e (similar to3 eV). The correlation between the he ating mode and the electron energy distribution function (EEDF) is qualitat ively interpreted in terms of non-local kinetic theory, taking account of t he ambipolar potential well. A biased optical probe diagnostics of a surfac e wave plasma (SWP) reveals that the surface heating mode gives a bi-Maxwel lian type EEDF, that is, a sum of two Maxwellian distributions of bulk temp erature T-b and tail temperature T-t > T-b. On the other hand, the EEDF of inductively coupled plasma (ICP) is close to a single-Maxwellian distributi on with electron temperature higher than the bulk temperature Tb of the SWP . Such differences in the EEDFs make the composition of the reactive specie s of the two plasmas different; namely, ion and radical measurements at the same electron density show that the ICP contains more F radicals and less CF3 and CF2 radicals in comparison with the SWP. In addition, a simplified model based on the bi-Maxwellian EEDF shows how the EEDF determines the ion and radical compositions, supporting the major experimental results. These observations and calculations suggest that plasma chemistry is controllabl e by tailoring the EEDF with proper adjustment of bulk heating and/or surfa ce heating of electrons.