Microwave plasma-assisted chemical vapor deposition for growing diamondss

Authors
Benedic, F Bougdira, J
Citation
F. Benedic et J. Bougdira, Microwave plasma-assisted chemical vapor deposition for growing diamondss, VIDE, 56(300), 2001, pp. 307
Citations number
33
Categorie Soggetti
Material Science & Engineering
Journal title
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS
ISSN journal
12660167 → ACNP
Volume
56
Issue
300
Year of publication
2001
Database
ISI
SICI code
1266-0167(2001)56:300<307:MPCVDF>2.0.ZU;2-5
Abstract
After a brief historic on the development of the different CVD methods used for diamond deposition, this article described reactors developed for the synthesis of diamond by MPACVD processes at low pressure. The role of the r eactive species such as the atomic hydrogen and the hydrocarbon radicals as well as the influence of the experimental parameters on the growth are pre sented.