Internal structures and shape memory properties of sputter-deposited thin films of a Ti-Ni-Cu alloy

Citation
T. Matsunaga et al., Internal structures and shape memory properties of sputter-deposited thin films of a Ti-Ni-Cu alloy, ACT MATER, 49(11), 2001, pp. 1921-1928
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
ACTA MATERIALIA
ISSN journal
13596454 → ACNP
Volume
49
Issue
11
Year of publication
2001
Pages
1921 - 1928
Database
ISI
SICI code
1359-6454(20010622)49:11<1921:ISASMP>2.0.ZU;2-J
Abstract
Low-temperature heat treatments of the sputter-deposited amorphous films, w hich were previously proved to be a new method to produce very good shape m emory properties for Ti-rich Ti-Ni alloys, have been applied to a ternary T i-43.0Ni-6.2Cu alloy (at.%). The basically same nanometric structures as in the binary alloy are formed, i.e. the nanometric structures consist of ext remely thin plate precipitates of bet structure, which are formed on {100} planes of the parent B2 structure and have the c-axis normal to the habit p lanes. High-shape recovery stresses of about 500 MPa with recoverable shape strains of 5% are obtained without accompanying any permanent strains. A s hape recovery stress of more than 870 MPa is attained if it is allowed to i nvolve about 1% permanent strain. Although these bet precipitates have larg e tetragonalities, they are perfectly coherent with the parent bcc lattice. The maximum shape recovery stress is nearly twice that of the Ti-rich Ti-N i binary alloy having a similar nanometric structure. It is suggested that this remarkable increase in recovery stress may be attributed to the change in Burgers vector of dislocations caused by partial disordering in Ti-Ni-C u alloys. It is emphasized that the shape recovery stress in this ternary a lloy is four times that of the Ti,Ni containing samples and 10 times that o f a bulk Ti-45Ni-5Cu alloy. (C) 2001 Acta Materialia Inc. Published by Else vier Science Ltd. All rights reserved.