T. Matsunaga et al., Internal structures and shape memory properties of sputter-deposited thin films of a Ti-Ni-Cu alloy, ACT MATER, 49(11), 2001, pp. 1921-1928
Low-temperature heat treatments of the sputter-deposited amorphous films, w
hich were previously proved to be a new method to produce very good shape m
emory properties for Ti-rich Ti-Ni alloys, have been applied to a ternary T
i-43.0Ni-6.2Cu alloy (at.%). The basically same nanometric structures as in
the binary alloy are formed, i.e. the nanometric structures consist of ext
remely thin plate precipitates of bet structure, which are formed on {100}
planes of the parent B2 structure and have the c-axis normal to the habit p
lanes. High-shape recovery stresses of about 500 MPa with recoverable shape
strains of 5% are obtained without accompanying any permanent strains. A s
hape recovery stress of more than 870 MPa is attained if it is allowed to i
nvolve about 1% permanent strain. Although these bet precipitates have larg
e tetragonalities, they are perfectly coherent with the parent bcc lattice.
The maximum shape recovery stress is nearly twice that of the Ti-rich Ti-N
i binary alloy having a similar nanometric structure. It is suggested that
this remarkable increase in recovery stress may be attributed to the change
in Burgers vector of dislocations caused by partial disordering in Ti-Ni-C
u alloys. It is emphasized that the shape recovery stress in this ternary a
lloy is four times that of the Ti,Ni containing samples and 10 times that o
f a bulk Ti-45Ni-5Cu alloy. (C) 2001 Acta Materialia Inc. Published by Else
vier Science Ltd. All rights reserved.