SHORT-PERIOD SURFACE SUPERLATTICES FORMED BY PLASMA-ETCHING

We report the development of a process for fabricating etched surface superlattices (SSL). We utilize few-voltage electron cyclotron resonan ce plasma etching in conjunction with electron beam lithography to for m a short-pitch grating relief on GaAs/AlGaAs heterostructures hosting a high-mobility two-dimensional electron gas (2DEG). The process mini mizes damage to the 2DEG and results in highly uniform etched gratings . A Schottky gate covering the etched surface appears to improve the e lectrical properties of the SSLs. Magnetotransport measurements show t he effectiveness of this technique in realizing high-quality SSLs with periods down to 100 nm.