Magnetic anisotropy in a permalloy microgrid fabricated by near-field optical lithography

Authors
Li, SP Lebib, A Peyrade, D Natali, M Chen, Y Lew, WS Bland, JAC
Citation
Sp. Li et al., Magnetic anisotropy in a permalloy microgrid fabricated by near-field optical lithography, J APPL PHYS, 90(1), 2001, pp. 521-523
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
1
Year of publication
2001
Pages
521 - 523
Database
ISI
SICI code
0021-8979(20010701)90:1<521:MAIAPM>2.0.ZU;2-X
Abstract
We report the fabrication and magnetic properties of permalloy microgrids p repared by near-field optical lithography and characterized using high-sens itivity magneto-optical Kerr effect techniques. A fourfold magnetic anisotr opy induced by the grid architecture is identified. (C) 2001 American Insti tute of Physics.