Formation of metallic surface structures by ion etching using a S-layer template

Citation
M. Panhorst et al., Formation of metallic surface structures by ion etching using a S-layer template, J VAC SCI B, 19(3), 2001, pp. 722-724
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
19
Issue
3
Year of publication
2001
Pages
722 - 724
Database
ISI
SICI code
1071-1023(200105/06)19:3<722:FOMSSB>2.0.ZU;2-D
Abstract
Crystalline cell surface layers (S-layer) of the bacteria species Deinococc us Radiodurans are used as an anometric template for patterning thin ferrom agnetic films. A hexagonal pattern of uniform 10-nm-wide dots and a lattice ,constant of 18 nm is fabricated from 2.5-nm-thick sputter deposited Co, Fe Co, Fe, CoNi, and NiFe. Suitable parameters for the subsequent Ar ion etchi ng are elaborated. For successful patterning, the etching energy ranges fro m 50 to 300 eV and the etching time from 17 to 283 s at an ion current of 1 .5- 5.5 muA/cm(2). The formation of nanodot arrays is demonstrated by scann ing electron and scanning force microscopy. (C) 2001 American Vacuum Societ y.