Electron emission from nanocrystalline diamond films

The; electron emission properties: of nanocrystalline diamond films were de scribed. The nanometer structured diamond films were deposited by the micro wave plasma assistance chemical vapor deposition method via continuous H+ i on bombardment. The grain size of nanocrystalline diamond films can be modi fied by means of changing the energy of bombarded ions. Scanning electron m icroscopy and Raman spectroscopy indicated the nanometer structure of the f ilms. The results suggested that low-field electron emission and high emiss ion current can be obtained from the films consisting of nanosized diamond grains. (C) 2001 American Vacuum Society.