A method for screening of coverage and film thickness of monolayers by projection of molecular electron density surface onto a substrate plane

Citation
K. Oberg et B. Eliasson, A method for screening of coverage and film thickness of monolayers by projection of molecular electron density surface onto a substrate plane, MATER LETT, 49(3-4), 2001, pp. 147-153
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS LETTERS
ISSN journal
0167577X → ACNP
Volume
49
Issue
3-4
Year of publication
2001
Pages
147 - 153
Database
ISI
SICI code
0167-577X(200106)49:3-4<147:AMFSOC>2.0.ZU;2-Q
Abstract
Self-assembled monolayer films of a copper tetraazaphthalocyanine have been prepared on quartz and silicon at 120 degreesC in DMF solution and at 250 degreesC in bromonaphthalene solution. A procedure is presented for obtaini ng film thickness for a sufficiently dense monolayer by fitting the 2D imag e of the 3D electron density surface of the chromophore in the film to a su rface-coverage measure derived from absorption spectroscopy. The film thick ness obtained by the electron density projection method is compared to that from ellipsometry. The projection method is expected to be useful for film -screening purposes and can also yield an average angle between the surface and chromophore normals. (C) 2001 Elsevier Science B.V. All rights reserve d.